about

Focusing on the research and development and production of advanced functional photoresist materials and electronic display special glue materials

Committed to promoting the development of the global semiconductor materials industry

company profile Corporate history

  • Founded

    2020 Year

  • Covered area

    2000 m²

  • Phase I construction area

    20,000 m²

  • Have reaction equipment

    60 Yutai

Xi'an Advance Chemistry New Material Co., Ltd.(Hereinafter referred to as“AC”),Located in the national science and technology enterprise accelerator in Xi'an,It is a research and development company、Production、A high-tech enterprise integrating sales。ACFocus on two directions: photoresist materials for semiconductors and special glue materials for electronic displays.,The main products are KrF、ArFPhotoresist monomer、Photoacid generatorPAG、High refractive indexOCAGlue monomerwait。

company profile Corporate history
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4,4-Hexafluoroisopropylphthalic anhydride

4,4-Hexafluoroisopropylphthalic anhydride

4,4-Hexafluoroisopropylphthalic anhydride

CAS:1107-00-2

  • Polyimide monomer
 1-(1,1-Dimethylpropoxy)-4-Vinylbenzene

1-(1,1-Dimethylpropoxy)-4-Vinylbenzene

1-(1,1-Dimethylpropoxy)-4-Vinylbenzene

CAS:146716-59-8

 pair(tert-Butylsulfonyl)Diazomethane

pair(tert-Butylsulfonyl)Diazomethane

pair(tert-Butylsulfonyl)Diazomethane

CAS:138529-84-7

  • Photoacid generator
pair(2,4-Dimethylphenylsulfonyl)Diazomethane

pair(2,4-Dimethylphenylsulfonyl)Diazomethane

pair(2,4-Dimethylphenylsulfonyl)Diazomethane

CAS:39153-56-5

  • Photoacid generator
 pair(Cyclohexylsulfonyl)Diazomethane

pair(Cyclohexylsulfonyl)Diazomethane

pair(Cyclohexylsulfonyl)Diazomethane

CAS:138529-81-4

  • Photoacid generator
 Tert-butyl 2-(two(2-Hydroxyethyl)Amino)Acetate

Tert-butyl 2-(two(2-Hydroxyethyl)Amino)Acetate

Tert-butyl 2-(two(2-Hydroxyethyl)Amino)Acetate

CAS:660440-94-8

  • Electronic material monomer
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development path

development history

2019

Early market accumulation

2020

3moon17day The company was established in Xi'an,R&D center established

2021

Established Photoresist Division,Committed to photoresist、OCAResearch and development of glue monomers

2021～2022

Shandong Advance Chemistry New Material Co., Ltd.成立,Covered area30mu,The construction area of ​​the first phase is approximately20000square meters,The annual production capacity of a single unit can reach400Ton

2023

partPRmonomer、OCAThe monomer has achieved mass production,The second phase of the factory is under construction

  • 2019

    Early market accumulation

  • 2020

    3moon17day The company was established in Xi'an,R&D center established

  • 2021

    Established Photoresist Division,Committed to photoresist、OCAResearch and development of glue monomers

  • 2021～2022

    Shandong Advance Chemistry New Material Co., Ltd.成立,Covered area30mu,The construction area of ​​the first phase is approximately20000square meters,The annual production capacity of a single unit can reach400Ton

  • 2023

    partPRmonomer、OCAThe monomer has achieved mass production,The second phase of the factory is under construction

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We forge ahead,Create brilliance,Every step witnesses the company's growth and leap,Create a better future together!