Industry News

Fast technology10moon25daily news,According to official WeChat news from Huazhong University of Science and Technology,recently,The school’s Wuhan National Research Center for Optoelectronics team,Be the first in the country to conquer the raw materials and formulas needed to synthesize photoresist,Promote key raw materials for my country's chip manufacturing to break through bottlenecks。

According to reports,its research and developmentT150APhotoresist series products,Passed semiconductor process mass production verification,Realized that all raw materials are domestically produced,Fully self-designed formula,It is expected to create a new situation in domestic semiconductor lithography manufacturing。

Public information display,Photoresist is a photosensitive material,Photolithography for chip manufacturing,Works like a camera's film exposure。During chip manufacturing,Photoresist will be applied to the wafer,Draw the circuit diagram on the mask。

Exposure occurs when light shines through the mask onto the photoresist.,After a series of processing,The required circuit diagram will be obtained on the wafer。

Since photoresist is a key material for chip manufacturing,Foreign companies keep their raw materials and formulas highly confidential,At present, more than 90% of the photoresist used in our country relies on imports.。

This semiconductor-specific photoresist developed by the Wuhan National Optoelectronics Research Center team benchmarks against the mainstream of leading international companies.KrFPhotoresist series。

Compared with a certain foreign product of the same series,T150AThe ultimate resolution demonstrated in the photolithography process reaches120nm,And the process tolerance is greater、More stable、Better film retention rate,It performs better on etching processes,Found by verificationT150AMedium dense graphics are etched,The side wall verticality of the lower medium is excellent。

The team leader said:“Starting from research on the molecular basis of photolithography technology and development of raw materials,Finally obtained formula technology with independent intellectual property rights,this is just the beginning。Our team will also develop a series of tools that can be used in different scenariosKrFandArFPhotoresist,Committed to breaking through the key technologies of foreign stuck necks,Bring more surprises to domestic related industries。”