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       Photoresist is a key material in the photolithography process,Photolithography process is the core process of integrated circuit manufacturing。Photoresist uses photochemistry reaction,The required fine patterns are transferred from the mask to the pattern transfer medium on the substrate to be processed through the photolithography process.,is light Key materials that enable selective etching in the etching process,It is widely used in the processing of fine graphic circuits in the optoelectronic information industry. make。In the manufacturing process of large-scale integrated circuits,Photolithography and etching technology are the most important processes in fine line pattern processing. art,Accounting for chip manufacturing time40%-50%Take integrated circuits as an example,The process of photolithography can be summarized as glue application、exposure、 Development and other links。Glue:Coating photoresist on wafer substrate,And perform pre-baking to remove the solvent；exposure:through Over mask,UV light、deep ultraviolet light、Electron beam、Light or radiation exposure such as ion beam,Make the exposed part of the photosensitive group chemical reaction；development:After baking, the photoresist is partially dissolved by developing,Form pattern from mask to substrate transfer of slices。